ThinFilms2026 Symposium Topics

Daniel CHUA, MSE, National University of Singapore, Singapore

Co-Chair:
Qing ZHANG, EEE, Nanyang Technological University, Singapore

Hyung Gyu PARK, POSTECH, Pohang University of Science and Technology, Korea

This symposium is for discussion and exchange of the state-of-the-art researches and developments on coatings and thin films for biomedical & healthcare applications, such as medical implants and prosthetics, wound healing dressings, contact Lenses, tissue engieering and biosensors. As one of the most interdisciplinary research area, topics of interests in this symposium include but not limited to:

1. Design, construction and characterization of the surface of various biomaterials, such as metals, ceramics, polymers, composites, as well as their bio-interfaces;
2. New ideas on biomedical & healthcare related applications;
3. Antibacterial, antifouling, anticoagulant and anti-inflammatory effects of coatings and thin films.

Kui CHENG, Zhejiang University, China

Co-Chair:

Peng LI, Northwestern Polytechnical University, China

Liqun XU, Southwestern University, China

This symposium focuses on the latest plasma technology and applications in the field of thin films, including plasma-based technologies, mechanism exploration, and applications. It welcomes participants from industries, universities, and research laboratories to submit papers featuring original research, case studies, and technical reviews. The potential topics may include but not limited to:

1. Simulation of plasma process for etch and deposition: PECVD, PVD, ALD, Etch, PLD, PA-MBE, and PSD etc. AI/ML integration for plasma process optimization and predictive modeling.
2. Mechanism of interaction between plasma and substrate surface.
3. Plasma multi-scale simulation modeling research: the motion and reactions of electrons, ions, and neutral particles; nucleation, and film nucleation/growth; the distribution and interaction of flow field, temperature field, and electromagnetic field.
4. Research on atmospheric pressure plasma: surface treatment technology; thin film deposition; coating preparation under ambient conditions.
5. Plasma treatment in application of environmental protection, biology, chemical industry, and energy fields. Green plasma technologies for sustainable manufacturing. Plasma-driven CO₂ conversion, VOC decomposition, and wastewater treatment.

Lang HU, Jihua Lab, China

Co-Chair:
Quanzhi ZHANG, Dalian University of Technology, China

Kesheng GUO, Jihua Lab, China

This symposium serves as a platform for researchers to explore recent advancements, challenges, and future directions and facilitate the exchange of knowledge and progress in computational and AI-driven materials science and application in thin films. Covering a wide range of simulation methodologies and AI-driven approaches, the symposium will emphasize the fundamental physics and chemistry governing functional elements in thin films and materials. Additionally, it will showcase innovations in materials design and discovery.

Topics of interest include, but are not limited to:
1. Methodology Development (ab initio calculations, continuum modeling, multiscale simulations, AI, and high-throughput workflows)

2. Modeling of Thin Films

3. Modeling of Materials (including traditional, novel, and sustainable materials)

4. AI for Materials (large language models, materials genome approaches, data science, and machine learning)
· CALPHAD (Computer Coupling of Phase Diagrams and Thermochemistry)

5. Modeling of Materials Degradation and Lifetime Estimation

6. Life Cycle Analysis (LCA) of Sustainable Materials and Processes

Jianwei ZHENG, Institute of High Performance Computing, Singapore

Co-Chair:
Chonghe LI, Shanghai University, China

Lei ZHANG, Nanjing University of Information Science and Technology, China

This symposium is for discussion and updates on technological inventions/developments in industrial applications of various thin films and coatings, including processing and characterization equipment as well as technologies for post-treatment of the waste liquids or gases in fabrication of films or coatings. We welcome participants from industries, universities, and research laboratories to submit papers with real case industrial applications. The potential topics may include but not limited to:

1. Nanostructure/nanocomposite/multilayer/gradient thin films and coatings
2. Hard yet tough nitride/carbide thin films and coatings; Hard and super hard nitride/carbide thin films and coatings; High entropy nitride/carbide thin films and coatings; Diamond-like carbon-related coatings
3. Physical vapour deposition techniques: High power impulse magnetron sputtering (HiPIMS); Filtered cathodic vacuum arc (FCVA); Pulse laser deposition (PLD)…
4. Surface and interface treatment for energy materials

De’en SUN, Southwest University, China

Co-Chair:
Fei MA, Xi’An Jiaotong University, China

Hongfei LIU, Institute of Materials Research and Engineering, A*STAR, Singapore

Lidong SUN, Chongqing University, China

Co-Chair:

Yixiang OU, Radiation Technology Institute, Beijing Academy of Science and Technology, China

Lu XIA, The Institute of Photonic Sciences, Spain

主席：周喻，中国中南大学教授 副主席：陈晓龙，中国南方科技大学助理教授, Central South University, China

Bobo TIAN, East China Normal University, China

Yong ZHANG, Fuyao University of Science and Technology, China

Co-Chair:
Cheng-yong WANG, Guangdong University of Technology, China

Jun SHEN, Fujian University of Technology, China

Peter K LIAW, The University of Tennessee Knoxville, USA

This Symposium focuses on recent advances in both fundamental and applied science of nanostructured thin films and coatings. Particular attentions will be given to the design, processing, characterization, properties, performance and applications of nanostructured thin films and coatings. Potential topics include but are not limited to the following:

• Nanocrystalline, heterogeneous-structured, graded, nanocomposite, multilayered, and porous films and coatings;
• Medium/high-entropy alloy coatings;
• Medium/high-entropy ceramic (oxide, nitride and carbide) coatings;
• Bottom-up processing techniques, including physical (e.g., PVD), chemical (e.g., CVD, electrodeposition) and additive manufacturing methods;
• Top-down nanofabrication techniques, including electron or ion beam nanolithography and scanning probe–based lithography, and laser micro-nano-texturing, etc.;
• Structural, microstructural, micro-/nanomechanical and in-situ characterization;
• Processing-structure-property-performance relationships;
• Advanced functional and structural applications.

Yingchun GUAN, Beihang University, China

Co-Chair:
Linda WU Yongling, Shandong University of Technology, China

LI Zhipeng, University of Science and Technology Beijing, China

This symposium is highly interdisciplinary and crosses the boundaries of thin films in the field of physics, chemistry, materials science and optics, and will address fundamental questions as well as applications. Topics of interests may include but not limited to,

1. Organic optoelectronics: organic semiconducting materials, physics and devices such as OPVs, OLEDs, OFETS, organic sensors, organic thermoelectrics, etc.;
2. Organics photonics: waveguide materials and devices, laser induced photonic structures, electro-optics/nonlinear polymers, etc.;
3. Other related topics: perovskite and hybrid organic-inorganic materials, physics and devices, etc.

Xiaotao HAO, Shandong University, China

Co-Chair:
Hiroyuki YOSHIDA, Chiba University, Japan
Han Young WOO, Korea University, South Korea

Optical thin films are one of the core technologies in modern optical research. This symposium aims to bring together global researchers in this field to discuss developing trends and recent progress, including the following topics:
Intelligent Design: AI-driven material design / Reverse engineering / Multi-objective optimization

Advanced Deposition: Atomic layer deposition (ALD) / Magnetron sputtering / Online process monitoring & intelligent control

Functional Materials: Phase-change memory alloys / Quantum photonic materials / Self-assembled metamaterials/Self-cleaning/Self-healing

Quantum Technologies: Quantum sensing / Metasurface-enabled stealth & super-resolution imaging

Smart Devices: Adaptive light/thermal regulation windows / Bio-inspired optical coatings/IR-transparent windows / Smart dynamic glazing / Photothermal management devices

Jiaqi ZHU, Harbin Institute of Technology, China

Co-Chair:

Kun-Lin Yang, National University of Singapore, Singapore

Yong Jin YOON, Korea Advanced Institute of Science and Technology (KAIST), Korea

Co-Chair:
Taek-Soo KIM, Korea Advanced Institute of Science and Technology (KAIST), Korea

The objective of this symposium is to bring together researchers working in the new and exciting areas of smart materials, thin films and microsystems, which include but not limited to the following topics:

• Piezoelectric thin films and applications;
• Shape memory alloys, polymers, and their film/coating;
• Intelligent and smart polymers, polymer composites, and surface engineering;
• Magnetostrictive and magnetoelectric films;
• Surface processing of smart materials;
• Metamaterials based on smart films;
• Thin films for flexible and wearable electronics;
• Smart microsystems, sensors and actuators, MESM, lab-on-chips
• Smart nanosystems, smart nanomaterials, and their nanoscale characterisations.

Yongqing FU, Northumbria University, UK

Co-Chair:
Jian ZHOU, Hunan University, China

Xueyong WEI, Xi’An Jiaotong University, China

Jingting LUO, Shenzhen University, China

This symposium provides a platform for the exchange of experimental and theoretical investigations into surface treatments (pre-treatment, post-treatments, hybrid-treatments) and coatings for surface protection applications, including mechanical (deformation, fracture, fatigue, delamination), tribological, anti-corrosion, anti-oxidation, as well as wetting & anti-wetting (e.g., anti-fogging, self-cleaning, anti-icing). In addition, surface treatments and coatings for protection or barriers under harsh environment impacts (high or ultra-high temperature and thermomechanical stresses) are also included.

The focus is on the effectiveness of surface protection via materials design, selection, simulation, process development, microstructural characterization, and optimization. The above list is not exhaustive – other relevant topics for surface protection are welcome.

Wan-Yu WU, National United University, Taiwan

Co-Chair:
Zhong CHEN, Nanyang Technological University, Singapore

Xinghua WU, Guangdong University of Technology, China

This symposium provides a platform for participants to share recent advancements in thin film device technologies. Thin films can be achieved through various physical and chemical methods. The further developments of thin film devices strongly depend on the state-of-the-art knowledge of thin film technologies. The topics of interests may include but not limited to:

1. Thin film preparation, characterization and device application
2. Novel thin film optical and electro-optical devices
3. Light-emitting devices
4. Thin film transistors and area-emitting transistors
5. Photovoltaics
6. Photodetectors
7. Gas sensors
8. Memory-based devices
9. Bio sensors and applications

Dong-Sing WUU, National Chi Nan University, Taiwan

Co-Chair:
Shui-Yang LIEN, Xiamen University of Technology, China

SS1:

Korea-Singapore Research Collaboration

(by invitation only)

Suk Won CHA, Seoul National University

Co-Chair:

Woosung PARK, Hanyang University, Korea

Jungwan CHO, Sungkyunkwan University, Korea

Sangwook PARK, Seoul National University, Korea

SS2:

Part Precision Machining and Surface Processing Technology

(by invitation only)

This symposium aims to provide a discussion and exchange platform for the latest research and progress in surface integrity and processing for functional component manufacturing. As an interdisciplinary field with a wide range of applications, topics of interest to this symposium include but are not limited to:

1. Precision machining surface integrity and application research;

2. Ceramic surface processing and film preparation and application;

3. Research and application of parts lubrication;

4. Research on the application of thin film materials in green energy

Yuhou WU, Shenyang Jianzhu University, China

Co-Chair:
Ke ZHANG, Shenyang University of Technology, China
Songhua LI, Shenyang Jianzhu University, China

SS3:

Nanoscale Surfaces, Interfaces, and Thin Films for Next-Generation Solid Oxide Cells

Solid oxide cells (SOCs)—encompassing fuel cells (SOFCs) and electrolyzers (SOECs)—hold transformative potential for clean energy. Their performance and durability are intrinsically governed by atomic-scale surface and interfacial phenomena, which dictate electrode kinetics, ionic conduction, and catalytic activity. This symposium focuses on leveraging thin-film technologies, nanoscale engineering, and computational design to overcome critical limitations in SOCs, including degradation, high operating temperatures, and sluggish kinetics. We aim to unite experimental and theoretical advances in surface/interface engineering, ionic transport optimization (protonic, oxygen-ionic, mixed, and triple conductors), and nanostructured architectures (e.g., thin-film coatings, nanoparticle decorations) to enable high-efficiency, low-temperature (<500°C), and stable SOCs. Contributions on micro-SOFCs, dopant segregation, and innovative fabrication methods are especially encouraged.

Symposium Scope
Topics include, but are not limited to:

Surface/Interface Engineering: Effects on electrode kinetics, ion conduction (bulk/surface), and catalytic reactions.

Thin Film & Nanofabrication: Coatings, heterostructures, and nanostructured electrodes for enhanced performance/stability.

Ionic/Electronic Transport: Protonic, oxygen-ionic, mixed, and triple-conducting oxides; dopant segregation impacts.

Low-Temperature & Micro-SOCs: Thin-film/membrane-based SOFCs/SOECs operating below 500°C; micro-SOFCs.

Computational Design: DFT, KMC, MD for interface dynamics, dopant selection, and transport mechanisms.

Advanced Characterization: In situ studies of surface/interfacial phenomena in thin-film SOCs.

Stability Solutions: Interfacial modifications for degradation mitigation.

Pei-Chen SU, Nanyang Technological University, Singapore

Co-Chair:

Liangdong Fang, Shenzhen University, China

SS4:

Surface engineering for semiconductor equipment component

This symposium is dedicated to surface engineering as a core technology for enhancing the performance of semiconductor equipment and components. It will showcase the latest breakthroughs in precision surface treatments, advanced characterization methods, and integrated engineering solutions that are pushing the boundaries of chip manufacturing yield, device functionality, and operational service life.We welcome participants from industries, universities, and research laboratories to submit papers with industrial applications. The potential topics may include but not limited to:

1. Surface Modification,Passivation, and Cleaning for Vacuum Chamber.
2. Functional Coatings for Critical Components in etch, deposition, inspection and manufacturing equipment.
3. Corrosion-Resistant Coatings for components exposed to aggressive chemistries and plasmas.
4. Surface tratements for semiconductor equipment and component processing tools.
5. 5. Thermal Management Solutions via engineered surfaces and coatings for heat spreaders and sinks.

Zhenhuai YANG, Jihua Lab, China

Co-Chair:

Qimin WANG, Guangdong University of Technology, China

Yongjie WANG, Harbin Institute of Technology, China